You can't control what you can't see
The whole slurry story: from tail ends to total protection
One large particle in a slurry solution can damage a wafer. With each wafer containing 100 CPU chips, damage like this can lead to upwards of $10,000 in losses. Continuous analysis of your process means more damage prevention and less damage control.
MANUFACTURING
PACKING
SHIPPING
LONG TERM STORAGE
MIXING
FILTRATION
CMP relies on the consistency of proprietary slurry solutions for proper performance, but the long journey from particle manufacturing to fab use leaves room for uncertainty.Â
Filtration is a last resort—by the time it is needed, you have little visibility into what happened upstream. Traditional nanoparticle analysis adds delays to an already lengthy slurry workflow and can consume valuable sample from CMP’s largest consumable.
Reduce process uncertainty. Increase process yield.
The future of nanoparticle metrology integrates real-time data for higher throughput and technology specialized to show you the whole picture.