Reliability confirmed with field testing
Live data captured by Mavlipa G3 in large-scale semiconductor manufacturing reveals direct links between specific slurry management adjustments and fluctuations in particle size metrics.
Bridging the gap
With advanced proprietary software and MSPOS technology, particle size sensitivity extends from 100 nanometers to over 10 microns while spanning 9 orders of magnitude in concentration. This range of information processing typically requires multiple analysis tools to achieve.
Patented Multi-Sensor Optical Particle Sizing (MSPOS)
Our MSPOS technology works by scattering focused laser light into off-axis high-speed sensor array. This enables continuous monitoring of solutions across 9 orders of magnitude of slurry particle concentration. without sample dilution, destruction, or handling.Â
Mavlipa G3
Product Specifications
Operational Temperature
Operational Humidity
Particle size, min
Concentration, max
Number of size bins
Wetted materials
Dimensions
Remote Monitoring
Pressure max
Flow max
10 C - 30 C
<80%
100 nm
1e9 part / mL
128
Teflon, sapphire, Kalrez
550 X 200 X 150 mm
Supported
2 bar
50 mL / min
Weight
<12 kg
